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Metal impurities in lithography materials are becoming a serious problem in leading-edge semiconductor device manufacturing. General ion-exchange type metal purifiers generally utilize a functional group with strong acidity. Since, various kinds of lithography materials are very sensitive to acidity, there is a risk of that acidity causing a deprotection reaction in chemically amplified resists, and hydration decomposition of ester solvents. In this paper, we will attempt to demonstrate that a novel membrane purifier called Nylonpolar can drastically reduce metal contaminants in organic solvents used for chemically amplified photoresists.
Andre Xiao,Kalon Ke, andYoshiaki Yamada
"Development of metal purifiers specific to lithography materials", Proc. SPIE 11612, Advances in Patterning Materials and Processes XXXVIII, 116120G (22 February 2021); https://doi.org/10.1117/12.2580109
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Andre Xiao, Kalon Ke, Yoshiaki Yamada, "Development of metal purifiers specific to lithography materials," Proc. SPIE 11612, Advances in Patterning Materials and Processes XXXVIII, 116120G (22 February 2021); https://doi.org/10.1117/12.2580109