Development of metal purifiers specific to lithography materials

Andre Xiao; Kalon Ke; Yoshiaki Yamada

doi:10.1117/12.2580109

22 February 2021 Development of metal purifiers specific to lithography materials

Andre Xiao, Kalon Ke, Yoshiaki Yamada

Proceedings Volume 11612, Advances in Patterning Materials and Processes XXXVIII; 116120G (2021) https://doi.org/10.1117/12.2580109
Event: SPIE Advanced Lithography, 2021, Online Only

Abstract

Metal impurities in lithography materials are becoming a serious problem in leading-edge semiconductor device manufacturing. General ion-exchange type metal purifiers generally utilize a functional group with strong acidity. Since, various kinds of lithography materials are very sensitive to acidity, there is a risk of that acidity causing a deprotection reaction in chemically amplified resists, and hydration decomposition of ester solvents. In this paper, we will attempt to demonstrate that a novel membrane purifier called Nylonpolar can drastically reduce metal contaminants in organic solvents used for chemically amplified photoresists.

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Andre Xiao, Kalon Ke, and Yoshiaki Yamada "Development of metal purifiers specific to lithography materials", Proc. SPIE 11612, Advances in Patterning Materials and Processes XXXVIII, 116120G (22 February 2021); https://doi.org/10.1117/12.2580109

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