ArF lightsource “GT66A” for next-generation immersion lithography enhancing EPE and CD performance

Toshihiro Oga; Shinichi Matsumoto; Taku Yamazaki; Takeshi Ohta; Satoru Bushida

doi:10.1117/12.2583729

22 February 2021 ArF lightsource “GT66A” for next-generation immersion lithography enhancing EPE and CD performance

Toshihiro Oga, Shinichi Matsumoto, Taku Yamazaki, Takeshi Ohta, Satoru Bushida

Proceedings Volume 11613, Optical Microlithography XXXIV; 116130T (2021) https://doi.org/10.1117/12.2583729
Event: SPIE Advanced Lithography, 2021, Online Only

Conference Poster

Abstract

A newly designed ArF immersion lightsource, GT66A is required to provide yield improvement on highly complexed multiple-patterning lithography and additional productivity to the chip makers. The DUV lightsource prospective, EPE needed to be paid attention in order to reduce LER/ LWR, Line Narrowing Module (LNM) demonstrates E95% stability improvement providing further OVL/ CDU improvement. In order to improve tool availability, GT66A key modules including LNM provides up to 50% expected life extension. Therefore, GT66A enables to provide high in availability with improved optical property for EPE enhancement simultaneously.

Conference Presentation

Citation Download Citation

Toshihiro Oga, Shinichi Matsumoto, Taku Yamazaki, Takeshi Ohta, and Satoru Bushida "ArF lightsource “GT66A” for next-generation immersion lithography enhancing EPE and CD performance", Proc. SPIE 11613, Optical Microlithography XXXIV, 116130T (22 February 2021); https://doi.org/10.1117/12.2583729

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