Large-scale fabrication of nano-architected functional materials via metasurface-enabled interference lithography

Andrew C. Friedman; Seyedeh Mahsa Kamali; Seola Lee; Tianzhe Zheng; Luizetta Elliott; Phillippe Pearson; Andrei Faraon; Julia R. Greer

doi:10.1117/12.2583224

5 March 2021 Large-scale fabrication of nano-architected functional materials via metasurface-enabled interference lithography

Andrew C. Friedman, Seyedeh Mahsa Kamali, Seola Lee, Tianzhe Zheng, Luizetta Elliott, Phillippe Pearson, Andrei Faraon, Julia R. Greer

Author Affiliations +

Proceedings Volume 11677, Laser 3D Manufacturing VIII; 116770X (2021) https://doi.org/10.1117/12.2583224
Event: SPIE LASE, 2021, Online Only

Abstract

We present a visible light interference lithography technique that utilizes a 2x2 cm metasurface mask to enable fabrication of 8x8 cm continuous and homogenous nano-architected materials. Patterns are resolved both in commercial 20-60 um films of SU-8 and >20 um films of custom glycidyl methacrylate-derived negative-tone photoresists. The combination of our metasurface-enabled large-scale 3D patterning technique with customizable photoresist chemistry provides a new pathway for scalable production of architected materials with nanometer feature resolution and advanced functional properties. Impact experiments using Laser-Induced Particle Impact Testing (LIPIT) were conducted to probe mechanical response and material homogeneity.

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Andrew C. Friedman, Seyedeh Mahsa Kamali, Seola Lee, Tianzhe Zheng, Luizetta Elliott, Phillippe Pearson, Andrei Faraon, and Julia R. Greer "Large-scale fabrication of nano-architected functional materials via metasurface-enabled interference lithography", Proc. SPIE 11677, Laser 3D Manufacturing VIII, 116770X (5 March 2021); https://doi.org/10.1117/12.2583224

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