Presentation
5 March 2021 Enhanced penetration depth of surface passivation in porous fluorescent 6H-SiC with Si/C-faces
Kosuke Yanai, Weifang Lu, Yoma Yamane, Satoshi Kamiyama, Tetuya Takeuchi, Motoaki Iwaya, Isamu Akasaki
Author Affiliations +
Abstract
We report on the fabrication, structure and characteristic of porous fluorescent SiC using voltage-controlled anodic oxidation method. In this experiment, the fluorescent SiC substrates were immersed in hydrofluoric acid for anodic oxidation etching. The porous structures changed significantly as the voltage increased to 10 V, 20 V and 30 V. Under a high voltage, it is considered that a large amount of electrons were injected into the fluorescent SiC and increased the anodic reaction rate. In the photoluminescence (PL) spectra, a emission peak in the short wavelength region was observed. And these emission intensities increase as the voltage increase.
Conference Presentation
© (2021) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kosuke Yanai, Weifang Lu, Yoma Yamane, Satoshi Kamiyama, Tetuya Takeuchi, Motoaki Iwaya, and Isamu Akasaki "Enhanced penetration depth of surface passivation in porous fluorescent 6H-SiC with Si/C-faces", Proc. SPIE 11706, Light-Emitting Devices, Materials, and Applications XXV, 117060X (5 March 2021); https://doi.org/10.1117/12.2577428
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KEYWORDS
Silicon carbide

Oxidation

Light emitting diodes

Luminescence

Boron

Nitrogen

Scanning electron microscopy

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