We report on the fabrication, structure and characteristic of porous fluorescent SiC using voltage-controlled anodic oxidation method. In this experiment, the fluorescent SiC substrates were immersed in hydrofluoric acid for anodic oxidation etching. The porous structures changed significantly as the voltage increased to 10 V, 20 V and 30 V. Under a high voltage, it is considered that a large amount of electrons were injected into the fluorescent SiC and increased the anodic reaction rate. In the photoluminescence (PL) spectra, a emission peak in the short wavelength region was observed. And these emission intensities increase as the voltage increase.
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