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To discuss the preparation technology of ultra-thin Polyimide (PI)/ Zirconium (Zr) self-standing composite film. Polyamide acid (PAA) solution was synthesized with 4,4'- diaminodiphenyl ether (ODA) and pyromellitic dianhydride (PMDA) as monomers. PI films were obtained by gradient temperature rise thermal imidization. A PI self-supporting film with a thickness of about 600 nm was obtained by the corrosion of ZnO release agent with dilute hydrochloric acid. After it was fixed in a copper frame with a diameter of 15 mm, a Zr film with a thickness of about 200 nm was deposited on it by direct-current magnetron sputtering. The composite film with a thickness of about 600 nm PI/200 nm Zr was obtained. PI film increased the mechanical properties of self-supporting Zr filter film, but in order to reduce the influence of PI film on the transmittance of Zr filter film, PI film was etched and thinned by excimer laser, and the thickness of 200 nm PI/ 200 nm Zr self-supporting filter film was prepared. This method deposited 200 nm Zr film on 600 nm self-supporting PI film, and then etched part of the PI film. 160 pulses were etched with excimer laser energy density of 40 mJ/cm2 and 26 pulses were etched with 70 mJ / cm2, and 200 nm PI /200 nm Zr self-supporting composite filter film was acquired respectively.
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