Paper
23 August 2021 High-brightness LDP source for EUVL mask inspection
Author Affiliations +
Abstract
The Laser-assisted discharge-produced (LDP) plasma EUV source was developed as a light source for actinic mask inspection and beamline application. Since the focused laser irradiation is used to ignite the discharge, the LDP plasma has a unique feature of high brightness and high power. It can be operated at the frequency of up to 10 kHz generating <200 W/mm2/sr in-band EUV brightness at plasma. The source reliability is also proven in the field as a source for actinic mask inspection. In the paper, the key performances of the LDP source will be discussed.
© (2021) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kazuya Aoki, Yoshihiko Sato, Yusuke Teramoto, Takahiro Shirai, Shunichi Morimoto, and Hidenori Watanabe "High-brightness LDP source for EUVL mask inspection", Proc. SPIE 11908, Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 119080I (23 August 2021); https://doi.org/10.1117/12.2601995
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KEYWORDS
Extreme ultraviolet

Plasma

Tin

Inspection

Light sources

Extreme ultraviolet lithography

Photomasks

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