Ion implantation as a new strategy for micro-LED pixelation

Jun Hee Choi; Jinjoo Park; Kiho Kong; Joo Hun Han; Jung Hun Park; Nakhyun Kim; Eunsung Lee; Joosung Kim; Dong Chul Shin; Younghwan Park; Jaikwang Shin

doi:10.1117/12.2612248

3 March 2022 Ion implantation as a new strategy for micro-LED pixelation

Jun Hee Choi, Jinjoo Park, Kiho Kong, Joo Hun Han, Jung Hun Park, Nakhyun Kim, Eunsung Lee, Joosung Kim, Dong Chul Shin, Younghwan Park, Jaikwang Shin

Author Affiliations +

Proceedings Volume 12022, Light-Emitting Devices, Materials, and Applications XXVI; 1202202 (2022) https://doi.org/10.1117/12.2612248
Event: SPIE OPTO, 2022, San Francisco, California, United States

Abstract

InGaN-based blue light-emitting diodes (LEDs), with their high efficiency and brightness, are entering the display industry. However, a significant gap remains between the expectation of highly efficient light sources and their experimental realization into tiny pixels for ultrahigh-density displays for augmented reality (AR). Her, we report using tailored ion implantation (TIIP) to fabricate highly-efficient, electrically-driven pixelated InGaN microLEDs (μLEDs) at the mid-submicron scale (line/space of 0.5/0.5 μm. Moreover, we demonstrate high-density TFT and QD C/F integration technologies.

Conference Presentation

Citation Download Citation

Jun Hee Choi, Jinjoo Park, Kiho Kong, Joo Hun Han, Jung Hun Park, Nakhyun Kim, Eunsung Lee, Joosung Kim, Dong Chul Shin, Younghwan Park, and Jaikwang Shin "Ion implantation as a new strategy for micro-LED pixelation", Proc. SPIE 12022, Light-Emitting Devices, Materials, and Applications XXVI, 1202202 (3 March 2022); https://doi.org/10.1117/12.2612248

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