Open Access Paper
5 July 2022 Front Matter: Volume 12054
Abstract
This PDF file contains the front matter associated with SPIE Proceedings Volume 12054, including the Title Page, Copyright information, Table of Contents, and Conference Committee listings.

The papers in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. Additional papers and presentation recordings may be available online in the SPIE Digital Library at SPIEDigitalLibrary.org.

The papers reflect the work and thoughts of the authors and are published herein as submitted. The publisher is not responsible for the validity of the information or for any outcomes resulting from reliance thereon.

Please use the following format to cite material from these proceedings:

Author(s), “Title of Paper,” in Novel Patterning Technologies 2022, edited by Eric M. Panning, J. Alexander Liddle, Proc. of SPIE 12054, Seven-digit Article CID Number (DD/MM/YYYY); (DOI URL).

ISSN: 0277-786X

ISSN: 1996-756X (electronic)

ISBN: 9781510649835

ISBN: 9781510649842 (electronic)

Published by

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Copyright © 2022 Society of Photo-Optical Instrumentation Engineers (SPIE).

Copying of material in this book for internal or personal use, or for the internal or personal use of specific clients, beyond the fair use provisions granted by the U.S. Copyright Law is authorized by SPIE subject to payment of fees. To obtain permission to use and share articles in this volume, visit Copyright Clearance Center at copyright.com. Other copying for republication, resale, advertising or promotion, or any form of systematic or multiple reproduction of any material in this book is prohibited except with permission in writing from the publisher.

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Publication of record for individual papers is online in the SPIE Digital Library.

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Paper Numbering: A unique citation identifier (CID) number is assigned to each article in the Proceedings of SPIE at the time of publication. Utilization of CIDs allows articles to be fully citable as soon as they are published online, and connects the same identifier to all online and print versions of the publication. SPIE uses a seven-digit CID article numbering system structured as follows:

  • The first five digits correspond to the SPIE volume number.

  • The last two digits indicate publication order within the volume using a Base 36 numbering system employing both numerals and letters. These two-number sets start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B … 0Z, followed by 10-1Z, 20-2Z, etc. The CID Number appears on each page of the manuscript.

Conference Committee

Symposium Chair

  • Kafai Lai, University of Hong Kong (United States)

Symposium Co-Chair

  • Qinghuang Lin, LAM Research Corporation (United States)

Conference Co-Chair

  • J. Alexander Liddle, National Institute of Standards and Technology (United States)

Conference Program Committee

  • Alan D. Brodie, KLA Corporation (United States)

  • Tito L. Busani, The University of New Mexico (United States)

  • Richard A. Farrell, Facebook Inc. (United States)

  • Sandip Halder, imec (Belgium)

  • Naoya Hayashi, Dai Nippon Printing Co., Ltd. (Japan)

  • Daniel J. C. Herr, The University of North Carolina at Greensboro (United States)

  • Tatsuhiko Higashiki, KIOXIA Corporation (Japan)

  • Erik R. Hosler, PsiQuantum Corporation (United States)

  • Stephen M. Kuebler, University of Central Florida (United States)

  • Chi-Chun Liu, IBM Corporation (United States)

  • Hans Loeschner, IMS Nanofabrication GmbH (Austria)

  • John G. Maltabes, Applied Materials GmbH & Company KG (United States)

  • Laurent Pain, CEA-LETI (France)

  • Ivo W. Rangelow, Technische Universität Ilmenau (Germany)

  • Douglas J. Resnick, Canon Nanotechnologies, Inc. (United States)

  • Ricardo Ruiz, Lawrence Berkeley National Laboratory (United States)

  • Martha I. Sanchez, Applied Materials, Inc. (United States)

  • Chandrasekhar Sarma, Intel Corporation (United States)

  • Gurpreet Singh, Intel Corporation (United States)

  • Lovejeet Singh, JSR Micro, Inc. (United States)

  • Seung Chul Song, Qualcomm (United States)

  • Ines A. Stolberg, Vistec Electron Beam GmbH (Germany)

  • Hsinyu Tsai, IBM Research - Almaden (United States)

  • Mark A. van de Kerkhof, ASML Netherlands B.V. (Netherlands)

  • Wei Wu, The University of Southern California (United States)

© (2022) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
"Front Matter: Volume 12054", Proc. SPIE 12054, Novel Patterning Technologies 2022, 1205401 (5 July 2022); https://doi.org/10.1117/12.2643326
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KEYWORDS
Nanoimprint lithography

Directed self assembly

Optical lithography

Nanofabrication

Photomasks

Optical components

Printing

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