Simulations of impacts on aerial image performance of defocus on different resolution enhancement technologies

Yaning Li; Yanqiu Li; Yiyu Sun; Pengzhi Wei

doi:10.1117/12.2606845

1 November 2021 Simulations of impacts on aerial image performance of defocus on different resolution enhancement technologies

Yaning Li, Yanqiu Li, Yiyu Sun, Pengzhi Wei

Author Affiliations +

Proceedings Volume 12057, Twelfth International Conference on Information Optics and Photonics; 1205747 (2021) https://doi.org/10.1117/12.2606845
Event: Twelfth International Conference on Information Optics and Photonics, 2021, Xi'an, China

Abstract

As lithographic technology continues to advance, the size of nodes has continually been decreased while the control of defocus has become stringent in the actual lithography process. Defocus is always uncertain in the practical exposure process due to multi-factor impact, which is supposed to be considered as an important element of the aerial imaging model. It’s necessary to analyze the influence of defocus on the aerial image. In this paper, aerial image approximates to a second-order polynomial for different defocus through Taylor series expansion. Then the respective and the joint impacts of the first-order defocus term and the second-order defocus term on aerial image for various conditions have been studied by simulation. Simulation shows that annulus illumination source can reduce the impact of the first-order defocus term and the second-order defocus term is more valuable to be studied and controlled to improve lithographic resolution and process robust

Citation Download Citation

Yaning Li, Yanqiu Li, Yiyu Sun, and Pengzhi Wei "Simulations of impacts on aerial image performance of defocus on different resolution enhancement technologies", Proc. SPIE 12057, Twelfth International Conference on Information Optics and Photonics, 1205747 (1 November 2021); https://doi.org/10.1117/12.2606845

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