Micro-Fresnel lens fabricated by electron-beam lithography

Shigeru Aoyama; Noriyoshi Horie; Tsukasa Yamashita

doi:10.1117/12.17936

1 May 1990 Micro-Fresnel lens fabricated by electron-beam lithography

Shigeru Aoyama, Noriyoshi Horie, Tsukasa Yamashita

Proceedings Volume 1211, Computer and Optically Formed Holographic Optics; (1990) https://doi.org/10.1117/12.17936
Event: OE/LASE '90, 1990, Los Angeles, CA, United States

Abstract

Novel electron-beam lithography techniques for fabricating micro Fresnel lens are proposed. A high performance blazed-micro Fresnel lens with a diffraction efficiency of 65% and an RMS wavefront aberration ofO.03A was obtained.

Citation Download Citation

Shigeru Aoyama, Noriyoshi Horie, and Tsukasa Yamashita "Micro-Fresnel lens fabricated by electron-beam lithography", Proc. SPIE 1211, Computer and Optically Formed Holographic Optics, (1 May 1990); https://doi.org/10.1117/12.17936

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