Optimization of laser written photomasks for photonic device manufacturing

Markus Greul; Holger Sailer; Matthias Wahl; John Duff; Jeff Michelmann; Richard Bojko; Dmitri Titko; Konrad Rössler; Nezih Ünal

doi:10.1117/12.2640799

15 September 2022 Optimization of laser written photomasks for photonic device manufacturing

Markus Greul, Holger Sailer, Matthias Wahl, John Duff, Jeff Michelmann, Richard Bojko, Dmitri Titko, Konrad Rössler, Nezih Ünal

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Proceedings Volume 12325, Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology; 123250P (2022) https://doi.org/10.1117/12.2640799
Event: Photomask Japan 2022, 2022, Online Only

Abstract

In this study, performance improvement of an i-line laser writer used in the manufacture of masks for photonic device applications was successfully achieved and demonstrated. This was accomplished by conducting a thorough investigation and analysis of key lithographic performance characteristics, enabling the identification of optimal exposure strategies. Subsequent process characterization and design calibration was then performed using software tools. To assess improvement, a side-by-side comparison of performance was made between two identical silicon nitride photonic devices: one fabricated by a mask made using the improved laser writer process, the other by a mask written using a variable shaped electron beam writer. These devices were compared for optical loss to assess mask performance. This study demonstrates that the improved laser writer process enables the production of masks capable of infrared silicon nitride photonic device manufacture. This presents an opportunity in reducing the mask manufacturing costs involved in the fabrication of photonic devices.

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Markus Greul, Holger Sailer, Matthias Wahl, John Duff, Jeff Michelmann, Richard Bojko, Dmitri Titko, Konrad Rössler, and Nezih Ünal "Optimization of laser written photomasks for photonic device manufacturing", Proc. SPIE 12325, Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 123250P (15 September 2022); https://doi.org/10.1117/12.2640799

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KEYWORDS

Photomasks

Manufacturing

Photonic devices

Calibration

Line edge roughness

Lithography

Waveguides

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