Development and evaluation of a photonics instrument for precise beam profile measurements by a XY-stage

S. Reichel; K. Blankenbach; A. Reber; E. Erel

doi:10.1117/12.2647730

8 March 2023 Development and evaluation of a photonics instrument for precise beam profile measurements by a XY-stage

S. Reichel, K. Blankenbach, A. Reber, E. Erel

Proceedings Volume 12428, Photonic Instrumentation Engineering X; 1242804 (2023) https://doi.org/10.1117/12.2647730
Event: SPIE OPTO, 2023, San Francisco, California, United States

Abstract

Many different applications require the precise acquisition of the spatial intensity distribution of a light source. Examples are measurements of M2 (beam quality parameter), numerical aperture (of an optical fiber), or light source characterization. The presented work shows the development and validation of a photonic instrument for spatially resolved precise light power measurement at different distances. The instrument consists of a XY-stage with a calibrated detector. It is located in a dark room with an additional black carpet to reduce stray light even from the surrounding. We designed and built a fully automated measurement device including data processing. Different sources can be measured at a freely selectable distance (Z direction) between source and detector. The detector is a photodiode with a transimpedance amplifier (calibrated). In front of the detector, an aperture ensures a precise XY resolution. The scan area is 52 mm in X and Y direction with the smallest step size of 0.2 μm and a repeatability error of less than 0.5 μm. The aperture is currently limited to ≥ 0.4 mm (diameter) due to mechanic reasons at our lab. From repeatability testing, we calculated the accuracy of the current instrumentation: a 2s experimental standard deviation of less than 0.8 %. Such a photonic instrument is the base for precise optical beam profile measurements.

Conference Presentation

Citation Download Citation

S. Reichel, K. Blankenbach, A. Reber, and E. Erel "Development and evaluation of a photonics instrument for precise beam profile measurements by a XY-stage", Proc. SPIE 12428, Photonic Instrumentation Engineering X, 1242804 (8 March 2023); https://doi.org/10.1117/12.2647730

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