Integration of UV-nanoimprint lithography with two-photon polymerization for scalable production

Lei Zheng; Axel Günther; Reinhard Caspary; Wolfgang Kowalsky; Bernhard Roth

doi:10.1117/12.2648030

15 March 2023 Integration of UV-nanoimprint lithography with two-photon polymerization for scalable production

Lei Zheng, Axel Günther, Reinhard Caspary, Wolfgang Kowalsky, Bernhard Roth

Proceedings Volume 12433, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI; 124330G (2023) https://doi.org/10.1117/12.2648030
Event: SPIE OPTO, 2023, San Francisco, California, United States

Abstract

In this work, we demonstrate a fabrication strategy for micro- and nanooptical structures by integrating UV-nanoimprint lithography (NIL) towards two-photon polymerization (2PP) for cost-effective scalable production. Herein, 2PP was first employed to create the structures. These were then used as master molds for the subsequent UV-NIL process for high-throughput replication. With this fabrication strategy, various structures with dimensions from sub-micrometer to centimeter scales were produced and replicated. High-quality UV imprinting of the 2PP-produced master sample can be realized. The demonstrated fabrication strategy exhibits great potential for applications in scalable production of optical and optoelectronic devices or systems.

Citation Download Citation

Lei Zheng, Axel Günther, Reinhard Caspary, Wolfgang Kowalsky, and Bernhard Roth "Integration of UV-nanoimprint lithography with two-photon polymerization for scalable production", Proc. SPIE 12433, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI, 124330G (15 March 2023); https://doi.org/10.1117/12.2648030

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KEYWORDS

Two photon polymerization

Fabrication

Lithography

Semiconducting wafers

Nanoimprint lithography

Silicon

3D metrology

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