Paper
1 November 2022 Mask variability with extraction of SEM image contour and area measurements
Author Affiliations +
Proceedings Volume 12472, 37th European Mask and Lithography Conference; 124720B (2022) https://doi.org/10.1117/12.2640124
Event: 37th European Mask and Lithography Conference, 2022, Leuven, Belgium
Abstract
This paper presents contour-based methods to assess mask variability. Mask certification depends on the measurement reliability and on criteria relevance. By now, ST and its maskshop partners rely mostly on CDSEM measurements for mask certification. However, this kind of metrology has limitations and, looking at the future, we think it would be timely to search for metrology which bypass those limitations. That is why we are looking at 2D metrology [1], especially to area and contour measurements [2] on SEM images using extracted contours. Thanks to the added value of 2D metrology, we expect to assess mask variability, mask uniformity and pattern fidelity. We also take the opportunity to compare the results on two FOVs (field of view) from the images provided by mask shops. Finally, we also intend to automate the whole measurement process to make it easier to use.
© (2022) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Matthieu Piloto, Romain Bange, and Frank Sundermann "Mask variability with extraction of SEM image contour and area measurements", Proc. SPIE 12472, 37th European Mask and Lithography Conference, 124720B (1 November 2022); https://doi.org/10.1117/12.2640124
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KEYWORDS
Scanning electron microscopy

Metrology

Photomasks

Calibration

Critical dimension metrology

Feature extraction

Reliability

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