The potential of e-beam lithography for micro- and nano-optics on large areas

Uwe D. Zeitner; Michael Banasch; Marcus Trost

doi:10.1117/12.2658440

30 April 2023 The potential of e-beam lithography for micro- and nano-optics on large areas

Uwe D. Zeitner, Michael Banasch, Marcus Trost

Proceedings Volume 12497, Novel Patterning Technologies 2023; 1249703 (2023) https://doi.org/10.1117/12.2658440
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States

Abstract

The availability of high-resolution and high throughput lithographic fabrication technologies such as electron-beam lithography based on Variable Shaped Beam writing and Character Projection opens the way for the flexible use of various optical nano-structures for some of the most demanding applications. The paper discusses the technical features, advantages, and limitations of these pattering approaches and will show how they can favorably be combined to realize optical nano-structures for applications, which are as diverse as gratings for ultra-short laser pulses or high resolution spectrometers, computer generated holograms for asphere testing, various optical meta-structures (lenses, gratings), or UV-polarizers.

Conference Presentation

Citation Download Citation

Uwe D. Zeitner, Michael Banasch, and Marcus Trost "The potential of e-beam lithography for micro- and nano-optics on large areas", Proc. SPIE 12497, Novel Patterning Technologies 2023, 1249703 (30 April 2023); https://doi.org/10.1117/12.2658440

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