Presentation + Paper
30 April 2023 Role of counter-anion chemistry, free volume, and reaction byproducts in chemically amplified resists
Author Affiliations +
Abstract
Fundamental understanding of the physical processes controlling deprotection in chemical amplified resists (CARs) is critical to improve their utility for high-resolution lithography. We employ a combined experimental and computational method to examine the impacts of excess free volume generation, reaction byproducts, catalyst clustering, and catalyst counter-anion chemistry/size on deprotection rates in a model terpolymer CAR. These studies suggest that catalyst diffusion can be enhanced by a combination of excess free volume and reaction byproducts, and that counter-anion chemistry/size plays a key role in local reaction rates, which stems from differences in the rotational mobility of the catalyst.
Conference Presentation
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Christopher M. Bottoms, Manolis Doxastakis, and Gila E. Stein "Role of counter-anion chemistry, free volume, and reaction byproducts in chemically amplified resists", Proc. SPIE 12498, Advances in Patterning Materials and Processes XL, 124980M (30 April 2023); https://doi.org/10.1117/12.2656952
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KEYWORDS
Polymers

Simulations

Diffusion

Polymer thin films

Chemistry

Film thickness

Photoacid generators

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