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30 April 2023 Dependence of swelling and dissolution kinetics of poly(4-hydroxystyrene) in alkaline aqueous solution on alkyl chain length of tetraalkylammonium hydroxide
Hitomi Betsumiya, Yuko Tsutsui Ito, Takahiro Kozawa, Kazuo Sakamoto, Makoto Muramatsu
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Proceedings Volume 12498, Advances in Patterning Materials and Processes XL; 1249829 (2023) https://doi.org/10.1117/12.2670175
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States
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Abstract
Recently chemically amplified resists are approaching their performance limits due to the fixed development process. In this study, the dissolution, swelling, and impedance change of resist polymers were measured by a development analyzer with a quartz crystal microbalance method. The resist polymer was poly(4-hydroxystyrene) (PHS), the hydroxyl groups of which were partially protected with t-butoxycarbonyl groups. The alkyl chain lengths of tetraalkylammonium hydroxide were varying from methyl to pentyl groups. When the alkyl chain length of TAAH increased from two to three, the dissolution mode markedly changed.
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Hitomi Betsumiya, Yuko Tsutsui Ito, Takahiro Kozawa, Kazuo Sakamoto, and Makoto Muramatsu "Dependence of swelling and dissolution kinetics of poly(4-hydroxystyrene) in alkaline aqueous solution on alkyl chain length of tetraalkylammonium hydroxide", Proc. SPIE 12498, Advances in Patterning Materials and Processes XL, 1249829 (30 April 2023); https://doi.org/10.1117/12.2670175
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KEYWORDS
Polymers
Extreme ultraviolet lithography
Photoresist processing
Chemically amplified resists
Film thickness
Miniaturization
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