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Infrared imaging detection technology has been widely used. In the process of using infrared images for target observation, a large amount of typical target infrared radiation characteristic data is needed as infrared reference information to eliminate interference factors such as environment, time period, and false targets to achieve accurate target identification. The acquisition of typical target infrared radiation characteristic data is to use infrared characteristic measurement equipment to accurately measure the measured target under various external environments and conditions, and finally form the available target infrared radiation characteristic data through data analysis and arrangement. Since infrared target characteristic data needs to be acquired in the field, these devices generally have the characteristics of working environment in the field environment, multiple types of measurement targets, long measurement distance and wide measurement space. Therefore, in order to eliminate the influence of external environmental factors and accurately obtain the infrared characteristics of the target, it is necessary to calibrate the key parameters of the large-aperture infrared characteristics measurement equipment on the test site. However, there is currently no field calibration capability for large-aperture infrared characteristic measurement equipment, which has a negative impact on the application of infrared imaging detection systems. In order to solve the above problems, this paper develops a large-aperture long-focus optical system in an external field environment, which mainly includes a high-temperature standard infrared radiation source, a large-aperture off-axis primary mirror, a secondary mirror, and a target. After the development was completed, it was applied in the external field environment to calibrate a certain high-resolution infrared characteristic measurement equipment, and the relevant data were analyzed. The analysis results show that the uniformity measurement uncertainty is better than 0.4K (k=2), the distortion measurement uncertainty is better than 1% (k=2). And a good application effect is achieved.
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