Certain linewidth measurements

Karl L. Harris; Israel Nadler Niv; Dorron D. Levy

doi:10.1117/12.20028

1 June 1990 Certain linewidth measurements

Karl L. Harris, Israel Nadler Niv, Dorron D. Levy

Proceedings Volume 1261, Integrated Circuit Metrology, Inspection, and Process Control IV; (1990) https://doi.org/10.1117/12.20028
Event: Microlithography '90, 1990, San Jose, CA, United States

Abstract

As feature sizes get smaller the error of measurement must also become smaller. An adequate sub-micron measurement must be correct, within a certain or determined error limit. The error limit for a metrology instrument designed for use on sub-micron features in a production environment, the Opal 702, was investigated experimentally. There are numerous contributors to Iinewidth measurement uncertainty; (1) Dynamic Precision (including wafer and system variations), (2) system Stability (determined in a way to avoid including wafer stability), and (3) Offset (dependent on signal interpretation or algorithm) [1]. In a practical way all these variables are incorporated in (4) Dynamic Uncertainty.

Citation Download Citation

Karl L. Harris, Israel Nadler Niv, and Dorron D. Levy "Certain linewidth measurements", Proc. SPIE 1261, Integrated Circuit Metrology, Inspection, and Process Control IV, (1 June 1990); https://doi.org/10.1117/12.20028

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