Paper
1 June 1990 Free volume and viscosity effects in polymer layers: application to lithographic processes
Patrick Jean Paniez, Michel J. Pons, Olivier P. Joubert
Author Affiliations +
Abstract
Due to the numerous hydroxyl groups present in Novolaks and PHS, large amounts of free volume are created during the spin coating process. The free volume variations can be observed using plasma etching techniques along with laser interferometry. The concept of free volume allows a clearer description of the bake process. The detection of free volume implies a better understanding of its role in the various steps of the lithographic process. Several applications of this technique are presented.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Patrick Jean Paniez, Michel J. Pons, and Olivier P. Joubert "Free volume and viscosity effects in polymer layers: application to lithographic processes", Proc. SPIE 1262, Advances in Resist Technology and Processing VII, (1 June 1990); https://doi.org/10.1117/12.20103
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CITATIONS
Cited by 3 scholarly publications and 2 patents.
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KEYWORDS
Polymers

Etching

Plasma etching

Lithography

Plasma

Semiconducting wafers

Molecules

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