Resist particles: surface or embedded

Satoru Kaneki

doi:10.1117/12.3009929

5 October 2023 Resist particles: surface or embedded

Satoru Kaneki

Proceedings Volume 12805, Bay Area Chrome Users Society Symposium 1981; 1280503 (2023) https://doi.org/10.1117/12.3009929
Event: First Annual BACUS Symposium, 1981, Sunnyvale, CA, United States

Abstract

Recently, micro-photolithography has made significant progress which demands more precise control of small particles, not only in wafer processing but in photomask-making as well. Since control of small particles is basic and important to this technology, efficient environmental equipment should be developed for achieving this demand. In getting better yield in mask-making we have to consider not only the environment but also the raw material itself. In today's meeting, I would like to discuss the following items about photo-resist particles on photo plates. I. Particles and Mask Defects 11 . Particle Detection III. Problems in Determing Specifications.

Citation Download Citation

Satoru Kaneki "Resist particles: surface or embedded", Proc. SPIE 12805, Bay Area Chrome Users Society Symposium 1981, 1280503 (5 October 2023); https://doi.org/10.1117/12.3009929

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