Paper
7 August 2024 YOLOv8n-EMA-ODC wafer defect classification model
Yuanyuan Li, Qiangkui Leng, Jianxu Lu
Author Affiliations +
Proceedings Volume 13229, Seventh International Conference on Advanced Electronic Materials, Computers, and Software Engineering (AEMCSE 2024); 1322902 (2024) https://doi.org/10.1117/12.3038166
Event: Seventh International Conference on Advanced Electronic Materials, Computers, and Software Engineering (AEMCSE 2024), 2024, Nanchang, China
Abstract
Wafer defect classification is a critical issue in the semiconductor field, yet the detection accuracy of existing methods still can be improved. In this paper, a novel method based on YOLOv8n is proposed, it integrates the EMA mechanism and ODConv. The EMA mechanism assigns higher weights to important features to enhance accuracy, while ODConv reduces computational complexity through parallel computation. Experimental results on the WM-811k dataset demonstrate that our method achieves an accuracy rate of 97.5%, which represents a 2.2% higher accuracy than the baseline model, while reducing computational complexity by approximately 27% compared to the baseline model. This result confirms that the proposed method can maintain high accuracy in the semiconductor field while having lower computational complexity.
(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.
Yuanyuan Li, Qiangkui Leng, and Jianxu Lu "YOLOv8n-EMA-ODC wafer defect classification model", Proc. SPIE 13229, Seventh International Conference on Advanced Electronic Materials, Computers, and Software Engineering (AEMCSE 2024), 1322902 (7 August 2024); https://doi.org/10.1117/12.3038166
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KEYWORDS
Semiconducting wafers

Feature extraction

Defect detection

Deep learning

Image classification

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