Suppression of columnar-structure formation in Mo-Si layered synthetic microstructures

Masahito Niibe; Masami Hayashida; Takashi Iizuka; Akira Miyake; Yutaka Watanabe; Rie Takahashi; Yasuaki Fukuda

doi:10.1117/12.23172

1 February 1991 Suppression of columnar-structure formation in Mo-Si layered synthetic microstructures

Masahito Niibe, Masami Hayashida, Takashi Iizuka, Akira Miyake, Yutaka Watanabe, Rie Takahashi, Yasuaki Fukuda

Proceedings Volume 1343, X-Ray/EUV Optics for Astronomy, Microscopy, Polarimetry, and Projection Lithography; (1991) https://doi.org/10.1117/12.23172
Event: 34th Annual International Technical Symposium on Optical and Optoelectronic Applied Science and Engineering, 1990, San Diego, CA, United States

Abstract

We have previously reported that columnar-structures were formed in electron beam (EB) deposited and DCmagnetron sputtered Mo-Si layered synthetic microstructures (LSMs). The columnar structures reduced x-ray reflectivity by roughing layer interfaces of the LSMs. We here investigated the conditions to suppress columnar structure formation, by varying the substrate temperature (T9) in EB deposition and the argon pressure (PAT ) in D C- and RF-sputtering. In the EB deposited LSMs, the columnar structure disappeared and almost uniform LSMs were obtamed both at T□ 400°C and T9< -155°C. In the DC- and RF-sputtered LSMs, the columnar structure formation was suppressed by lowering PAr. The measured x-ray reflectivity of the LSMs increased according to the suppression of the columnar structure formation.

Citation Download Citation

Masahito Niibe, Masami Hayashida, Takashi Iizuka, Akira Miyake, Yutaka Watanabe, Rie Takahashi, and Yasuaki Fukuda "Suppression of columnar-structure formation in Mo-Si layered synthetic microstructures", Proc. SPIE 1343, X-Ray/EUV Optics for Astronomy, Microscopy, Polarimetry, and Projection Lithography, (1 February 1991); https://doi.org/10.1117/12.23172

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