Paper
1 December 1991 Nonlinear effects in hidden picture amplification and contrast improvement in polymer electron and Roentgenoresist PMMA
A. P. Aleksandrov, Vladimir N. Genkin, M. Yu. Myl'nikov, Nikolay V. Rukhman
Author Affiliations +
Proceedings Volume 1440, Optical Radiation Interaction with Matter; (1991) https://doi.org/10.1117/12.48182
Event: Optical Radiation Interaction with Matter, 1990, Leningrad, Russian Federation
Abstract
Some aspects of the laser light-polymer resist interaction are discussed. A possible way to increase the sensitivity and contrast is shown. 1. The laser chemicai technologies are widely used in indust- ryfi]. Here we analyze the laser capabilities of solving some elect- ron and roentgenolitography problems. It is shown, that the problems of polymer resist low sensitivity and contrast can be solved by light modification [2, 3].
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
A. P. Aleksandrov, Vladimir N. Genkin, M. Yu. Myl'nikov, and Nikolay V. Rukhman "Nonlinear effects in hidden picture amplification and contrast improvement in polymer electron and Roentgenoresist PMMA", Proc. SPIE 1440, Optical Radiation Interaction with Matter, (1 December 1991); https://doi.org/10.1117/12.48182
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Polymethylmethacrylate

Absorption

Polymers

Ultraviolet radiation

Quantum efficiency

Excimer lasers

Laser ablation

RELATED CONTENT

UV-Laser Photoablation Of Polymers
Proceedings of SPIE (April 10 1989)
Charge transfer approach to negative resists
Proceedings of SPIE (June 01 1992)
Excimer laser polymer ablation: the first twenty years
Proceedings of SPIE (September 13 2002)

Back to Top