Excimer laser photolithography with a 1:1 broadband catadioptric optics

Yudong Zhang; Dunwu Lu; Haixing Zou; ZhiJiang Wang

doi:10.1117/12.44804

1 July 1991 Excimer laser photolithography with a 1:1 broadband catadioptric optics

Yudong Zhang, Dunwu Lu, Haixing Zou, ZhiJiang Wang

Author Affiliations +

Proceedings Volume 1463, Optical/Laser Microlithography IV; (1991) https://doi.org/10.1117/12.44804
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

Design and construction of a deep-UV projection lens for use in sub-micron excimer laser lithography is reported. Its spectral band is wide enough for an unnarrowed excimer laser used as an illumination source.

Citation Download Citation

Yudong Zhang, Dunwu Lu, Haixing Zou, and ZhiJiang Wang "Excimer laser photolithography with a 1:1 broadband catadioptric optics", Proc. SPIE 1463, Optical/Laser Microlithography IV, (1 July 1991); https://doi.org/10.1117/12.44804

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE