Transparent phase-shifting mask with multistage phase shifter and comb-shaped shifter

Hisashi Watanabe; Yoshihiro Todokoro; Yoshihiko Hirai; Morio Inoue

doi:10.1117/12.44832

1 July 1991 Transparent phase-shifting mask with multistage phase shifter and comb-shaped shifter

Hisashi Watanabe, Yoshihiro Todokoro, Yoshihiko Hirai, Morio Inoue

Proceedings Volume 1463, Optical/Laser Microlithography IV; (1991) https://doi.org/10.1117/12.44832
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

This paper introduces the novel concepts of 'multistage phase shifter' and 'comb-shaped shifter' for resolving the problems of a transparent type phase shifting mask. The use of a multistage shifter decreases the light intensity dip at the shifter edges. The use of the comb- shaped shifter enables control of the pattern width. The effectiveness of a multistage shifter and a comb-shaped shifter were demonstrated by experiments and simulations. These technologies make it possible to fabricate a wide range of patterns for VLSI using the transparent phase shifting mask.

Citation Download Citation

Hisashi Watanabe, Yoshihiro Todokoro, Yoshihiko Hirai, and Morio Inoue "Transparent phase-shifting mask with multistage phase shifter and comb-shaped shifter", Proc. SPIE 1463, Optical/Laser Microlithography IV, (1 July 1991); https://doi.org/10.1117/12.44832

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