Exposure dose optimization for a positive resist containing polyfunctional photoactive compound

Peter Trefonas III; Chris A. Mack

doi:10.1117/12.46363

1 June 1991 Exposure dose optimization for a positive resist containing polyfunctional photoactive compound

Peter Trefonas III, Chris A. Mack

Proceedings Volume 1466, Advances in Resist Technology and Processing VIII; (1991) https://doi.org/10.1117/12.46363
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

Methods for optimizing the photolithographic process with respect to exposure dose are described. Various latent image gradients (the photoactive compound gradient, the dissolution rate gradient, and the log dissolution rate gradient) at the mask edge in the resist film are compared as a function of exposure dose. The relationship between the sequential photochemical decomposition of poly-diazonaphthoquinone photoactive compound, dissolution models and the dissolution selectivity parameter n is discussed. A methodology using full scale simulation to explore the effect of exposure sizing dose upon resist profile sidewall angle, exposure latitude, focus range, and linewidth variation with resist thickness (swing ratio) is described and compared to simpler models based upon the use of latent image gradients. Finally, the correspondence between simulation and experiment is explored.

Citation Download Citation

Peter Trefonas III and Chris A. Mack "Exposure dose optimization for a positive resist containing polyfunctional photoactive compound", Proc. SPIE 1466, Advances in Resist Technology and Processing VIII, (1 June 1991); https://doi.org/10.1117/12.46363

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