Ray tracing homogenizing mirrors for synchrotron x-ray lithography

Michael Homer; Roy J. Rosser; R. J. Speer

doi:10.1117/12.48645

1 December 1991 Ray tracing homogenizing mirrors for synchrotron x-ray lithography

Michael Homer, Roy J. Rosser, R. J. Speer

Proceedings Volume 1527, Current Developments in Optical Design and Optical Engineering; (1991) https://doi.org/10.1117/12.48645
Event: San Diego, '91, 1991, San Diego, CA, United States

Abstract

An original plastic-lens array molded integrally as one block having a function of forming a unit-magnification erect image has been developed. The lens array consists of eight lens devices. The lens device has a roof prism, a reflecting v-groove, and a pair of convex-lens surfaces. A prototype of the lens arrays are arranged side by side. Thickness of the lens array is 4.5 mm, distance between object and image planes is 14.4 mm, array pitch is 1.3 mm, and the effective imaging region is 220 mm. The average modulation transfer function (MTF) at 41 p/mm of the lens array is 76% in the row direction (Y-direction) and 80% in the direction (X-direction) normal to Y-direction. The average F/NO in line-scanning is 1.8. The average irradience unevenness in line-scanning is 17%. The focal depth is +/- 0.6 mm in the area with the MTF being 60% or more. With this prototype a high-resolution image was attained. So, the lens arrays can be applied to imaging devices for use in a compact facsimile, image scanner, LED printer, and so on.

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Michael Homer, Roy J. Rosser, and R. J. Speer "Ray tracing homogenizing mirrors for synchrotron x-ray lithography", Proc. SPIE 1527, Current Developments in Optical Design and Optical Engineering, (1 December 1991); https://doi.org/10.1117/12.48645

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KEYWORDS

Mirrors

Lithography

Synchrotrons

Ray tracing

X-ray lithography

Holmium

Reflectivity

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