Ion treatment in technology of diffraction optical elements

Natalia P. Shevchenko; K. D. Megorskaja; Irina N. Reshetnikova

doi:10.1117/12.50099

1 October 1991 Ion treatment in technology of diffraction optical elements

Natalia P. Shevchenko, K. D. Megorskaja, Irina N. Reshetnikova

Proceedings Volume 1574, Intl Colloquium on Diffractive Optical Elements; (1991) https://doi.org/10.1117/12.50099
Event: International Colloquium on Diffractive Optical Elements, 1991, Szklarska Poreba, Poland

Abstract

Problems of ion treatment in diffraction optical elements (DOE) technology with ion beam and reactive ion beam systems are discussed. Etching is carried out with particular screening of ion beam on contact protecting masks, which are films of organic (light sensitivity composition on the novolac base) and inorganic (vacuum deposited films of Al, ZnS, Nd2O3, As-S) materials. DOE microstructure parameters and optical-technical characteristics of DOE produced on the surface of optical glasses (binary synthesized holograms, phase filters, phase modulating elements of kinoform type with high efficiency) are reported.

Citation Download Citation

Natalia P. Shevchenko, K. D. Megorskaja, and Irina N. Reshetnikova "Ion treatment in technology of diffraction optical elements", Proc. SPIE 1574, Intl Colloquium on Diffractive Optical Elements, (1 October 1991); https://doi.org/10.1117/12.50099

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available