Critical parameters for the preparation of low-scatter electroless     nickel coatings

Douglas L. Hibbard

doi:10.1117/12.140699

12 February 1993 Critical parameters for the preparation of low scatter electroless nickel coatings

Douglas L. Hibbard

Proceedings Volume 1753, Stray Radiation in Optical Systems II; (1993) https://doi.org/10.1117/12.140699
Event: San Diego '92, 1992, San Diego, CA, United States

Abstract

Scattering sites in diamond-turned electroless nickel (EN) coatings are typically the result of surface defects originating from the plating process. This paper presents a description of these defects, their origin, and how they can be minimized.

Citation Download Citation

Douglas L. Hibbard "Critical parameters for the preparation of low scatter electroless nickel coatings", Proc. SPIE 1753, Stray Radiation in Optical Systems II, (12 February 1993); https://doi.org/10.1117/12.140699

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