Accurate infrared scene simulation by means of microlithographically deposited substrate

Dario Cabib; Yehoshua Eliason; Bob Hermes; Emanuel Ben-David; Shai Ghilai; Ronni Bracha

doi:10.1117/12.138978

5 January 1993 Accurate infrared scene simulation by means of microlithographically deposited substrate

Dario Cabib, Yehoshua Eliason, Bob Hermes, Emanuel Ben-David, Shai Ghilai, Ronni Bracha

Proceedings Volume 1762, Infrared Technology XVIII; (1993) https://doi.org/10.1117/12.138978
Event: San Diego '92, 1992, San Diego, CA, United States

Abstract

A few years ago, a microlithographic deposition process on infrared-transmitting substrates was developed in order to produce realistic infrared scenes for FLIR testing. In recent months, the performance of this product, named Thermoscene, has been improved by improving the control over the production process. The two main results are: (1) An increase in the number of simulated grey levels from 15 to 290, without reduction of the total number of pixels. (2) A decrease in imperfections, such as unwanted holes in the mesh deposition, to almost zero. The Thermoscene is useful as a component of infrared simulators, to project realistic infrared scenes through collimating optics to a FLIR, missile seeker, etc., for testing purposes.

Citation Download Citation

Dario Cabib, Yehoshua Eliason, Bob Hermes, Emanuel Ben-David, Shai Ghilai, and Ronni Bracha "Accurate infrared scene simulation by means of microlithographically deposited substrate", Proc. SPIE 1762, Infrared Technology XVIII, (5 January 1993); https://doi.org/10.1117/12.138978

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