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An advanced method was developed for MESFET burn-in purposes, based on preserving the samples in different stages of the degradation process, due to thermal and electrical stress, for subsequent structural investigations. This is performed by the automatic termination of the electrical stress separately on any device before its complete destruction. The equipment realizing this method is also described.
Balazs Kovacs,Imre Mojzes, andFerenc Csanyi
"Advanced MESFET burn-in method and equipment", Proc. SPIE 1783, International Conference of Microelectronics: Microelectronics '92, (1 August 1992); https://doi.org/10.1117/12.131060
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Balazs Kovacs, Imre Mojzes, Ferenc Csanyi, "Advanced MESFET burn-in method and equipment," Proc. SPIE 1783, International Conference of Microelectronics: Microelectronics '92, (1 August 1992); https://doi.org/10.1117/12.131060