Self-aligned rim-type phase-shift mask fabrication by backside exposure

David S. O'Grady; Stan P. Bajuk; Edward T. Smith

doi:10.1117/12.150457

8 August 1993 Self-aligned rim-type phase-shift mask fabrication by backside exposure

David S. O'Grady, Stan P. Bajuk, Edward T. Smith

Proceedings Volume 1927, Optical/Laser Microlithography; (1993) https://doi.org/10.1117/12.150457
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

A novel technique to fabricate a rim-type phase-shifting mask has been developed by exposing the back side of the mask with light. Such a mask requires no significant modification to conventional design layouts and improves aerial image contrast and depth of focus over that of a conventional reticle. The technique is self-aligning, and requires only one data writing level. Results for the simple and highly controllable process are presented, characterizing rim size versus dose and rim image uniformity, linearity, fidelity, and controllability.

Citation Download Citation

David S. O'Grady, Stan P. Bajuk, and Edward T. Smith "Self-aligned rim-type phase-shift mask fabrication by backside exposure", Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); https://doi.org/10.1117/12.150457

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