Paper
20 January 1994 Passive optical devices in polymers
Werner F. Frank, Frank Linke, Alexander Schoesser, Torsten K. Strempel, Stefan Brunner, Dorothee M. Rueck, Uwe F. W. Behringer, Theo T. Tschudi, Hilmar Franke, Tomas R. Sterkenburgh
Author Affiliations +
Abstract
Surfaces of PMMA [poly-(methyl-meth-acrylate)] have been modified by two methods of ionizing radiation: ion beam induced polymer structure formation (IBIPS) and light induced polymer structure formation (LIPS). Mask construction is described. Strip waveguides, branches and star couplers were generated. A method of fiber-chip coupling by etched V-grooves in silicon wafers is reported.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Werner F. Frank, Frank Linke, Alexander Schoesser, Torsten K. Strempel, Stefan Brunner, Dorothee M. Rueck, Uwe F. W. Behringer, Theo T. Tschudi, Hilmar Franke, and Tomas R. Sterkenburgh "Passive optical devices in polymers", Proc. SPIE 2042, Photopolymers and Applications in Holography, Optical Data Storage, Optical Sensors, and Interconnects, (20 January 1994); https://doi.org/10.1117/12.166319
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Cited by 2 scholarly publications.
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KEYWORDS
Waveguides

Photomasks

Semiconducting wafers

Silicon

Polymethylmethacrylate

Polymers

Ions

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