Paper
1 June 1994 High-power and highly reliable operation of all-MOCVD-grown 1.48-um diode lasers
Tadashi Nishimura, Yasuo Nakajima, T. Kimura, Yoshihiro Kokubo, K. Isshiki, Etsuji Omura, Masao Aiga, Kenji Ikeda
Author Affiliations +
Abstract
High output power and long-term stable operation have been realized in all-MOCVD grown 1.48 micrometers buried heterostructure lasers. For the purpose of high power operation, a diode with a cavity length of 1800 micrometers was mounted junction down. This diode shows the maximum output power of 310 mW at 25 degree(s)C, cw. A preliminary aging test is being carried on at a temperature of 50 degree(s)C with a constant light output of 100 mW for the diodes with cavity length of 900 micrometers and junction up configuration. Long-term stable operation over 3000 hrs and the estimated MTTF of 2.4 X 105 hrs at 50 degree(s)C, 100 mW have been realized. As another advantage of the all-MOCVD process, the uniformity of the laser characteristics is also demonstrated. Lasers with a cavity length of 900 micrometers in junction-up configuration are assembled from a processed 2-inch wafer.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tadashi Nishimura, Yasuo Nakajima, T. Kimura, Yoshihiro Kokubo, K. Isshiki, Etsuji Omura, Masao Aiga, and Kenji Ikeda "High-power and highly reliable operation of all-MOCVD-grown 1.48-um diode lasers", Proc. SPIE 2148, Laser Diode Technology and Applications VI, (1 June 1994); https://doi.org/10.1117/12.176607
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KEYWORDS
Diodes

Semiconducting wafers

High power lasers

Semiconductor lasers

Photomasks

Metalorganic chemical vapor deposition

Copper

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