Miniature electron microscopes for lithography

Alan D. Feinerman; David A. Crewe; Dung-Ching Perng; Capp A. Spindt; Paul R. Schwoebel; Albert V. Crewe

doi:10.1117/12.175812

13 May 1994 Miniature electron microscopes for lithography

Alan D. Feinerman, David A. Crewe, Dung-Ching Perng, Capp A. Spindt, Paul R. Schwoebel, Albert V. Crewe

Proceedings Volume 2194, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV; (1994) https://doi.org/10.1117/12.175812
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

Two inexpensive and extremely accurate methods for fabricating miniature 10 - 50 kV and 0.5 - 10 kV electron beam columns have been developed: `slicing,' and `stacking.' Two or three miniature columns could be used to perform a 20 nm or better alignment of an x-ray mask to a substrate. An array of miniature columns could be used for rapid wafer inspection and high throughput electron beam lithography. The column fabrication methods combine the precision of semiconductor processing and fiber optic technologies to create macroscopic structures consisting of charged particle sources, deflecting and focusing electrodes, and detectors. The overall performance of the miniature column also depends on the emission characteristics of the micromachined electron source which is currently being investigated.

Citation Download Citation

Alan D. Feinerman, David A. Crewe, Dung-Ching Perng, Capp A. Spindt, Paul R. Schwoebel, and Albert V. Crewe "Miniature electron microscopes for lithography", Proc. SPIE 2194, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV, (13 May 1994); https://doi.org/10.1117/12.175812

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