Application of the aerial image measurement system (AIMS)TM to the analysis of binary mask imaging and resolution enhancement techniques

Ronald M. Martino; Richard A. Ferguson; Russell A. Budd; John L. Staples; Lars W. Liebmann; Antoinette F. Molless; Derek B. Dove; J. Tracy Weed

doi:10.1117/12.175452

17 May 1994 Application of the aerial image measurement system (AIMS)^TM to the analysis of binary mask imaging and resolution enhancement techniques

Ronald M. Martino, Richard A. Ferguson, Russell A. Budd, John L. Staples, Lars W. Liebmann, Antoinette F. Molless, Derek B. Dove, J. Tracy Weed

Author Affiliations +

Proceedings Volume 2197, Optical/Laser Microlithography VII; (1994) https://doi.org/10.1117/12.175452
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

The newly developed Aerial Image Measurement System (AIMS^TM*) was used to quantify the lithographic benefits of several resolution enhancement techniques as compared to standard binary mask imaging. This system, a microscope based stepper emulator, permits rapid characterization of mask images from both binary and phase shifted mask (PSM) patterns at multiple focal planes. The resultant images are captured digitally with a CCD camera and analyzed using an exposure-defocus tree technique to quantify the depth-of-focus as a function of exposure latitude. The AIMS is used to extract both phase and transmission errors from captured aerial images of all the masks evaluated. AIMS results are compared to wafer electrical linewidth data. A 0.5 numerical aperture (NA) DUV stepper was used with a partial coherence of 0.6 combined with IBM APEX-E resist process. Collected data were analyzed using techniques identical to the AIMS analysis, allowing for a high level of consistency. Comparative data focused on binary mask imaging for the verification of the AIMS results. Trends associated with feature sizes and types are discussed.

Citation Download Citation

Ronald M. Martino, Richard A. Ferguson, Russell A. Budd, John L. Staples, Lars W. Liebmann, Antoinette F. Molless, Derek B. Dove, and J. Tracy Weed "Application of the aerial image measurement system (AIMS)^TM to the analysis of binary mask imaging and resolution enhancement techniques", Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); https://doi.org/10.1117/12.175452

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available