Techniques for improving overlay on multilayer phase-shift masks

Henry Chris Hamaker; Michael J. Bohan; Peter D. Buck; Claudia H. Geller; Takashi Makiyama; Francis P. Mathew; William S. Neeland

doi:10.1117/12.175411

17 May 1994 Techniques for improving overlay on multilayer phase-shift masks

Henry Chris Hamaker, Michael J. Bohan, Peter D. Buck, Claudia H. Geller, Takashi Makiyama, Francis P. Mathew, William S. Neeland

Author Affiliations +

Proceedings Volume 2197, Optical/Laser Microlithography VII; (1994) https://doi.org/10.1117/12.175411
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

Techniques used to optimize the alignment performance of the CORE-2564PSM reticle writer are presented. In particular, unique procedures for accurately locating alignment marks with nonuniform background intensities are discussed. Site-by-site automatic illumination control is implemented to ensure optimal image intensity and contrast for the CCD-based image capture system. Process and metrology considerations that affect error measurement are discussed. The mean + range/2 aligned overlay of the CORE-2564PSM is shown to be 35 - 55 nm.

Citation Download Citation

Henry Chris Hamaker, Michael J. Bohan, Peter D. Buck, Claudia H. Geller, Takashi Makiyama, Francis P. Mathew, and William S. Neeland "Techniques for improving overlay on multilayer phase-shift masks", Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); https://doi.org/10.1117/12.175411

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