Goal-Oriented Process Tuning

Mary L. Long; Michael A. Schmidt

doi:10.1117/12.958639

5 September 1980 Goal-Oriented Process Tuning

Mary L. Long, Michael A. Schmidt

Proceedings Volume 0221, Developments in Semiconductor Microlithography V; (1980) https://doi.org/10.1117/12.958639
Event: Semiconductor Microlithography V, 1980, San Jose, United States

Abstract

Following a decade of rapidly shrinking linewidths, semiconductor microlithography stopped short of the predicted one micron level and hovered for most of the 1970's at five microns (or 0.2 mils). By 1979, various developments in equipment, materials and processing allowed the downward trend to be resumed. The gap between five microns and one micron appears to be closing rapidly, with micron and sub-micron lithography again being predicted for high volume manufacturing.

Citation Download Citation

Mary L. Long and Michael A. Schmidt "Goal-Oriented Process Tuning", Proc. SPIE 0221, Developments in Semiconductor Microlithography V, (5 September 1980); https://doi.org/10.1117/12.958639

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