Ultra-clean fabrication techniques

Carl Johnson; Abdu Boudour; Eric T. Chase

doi:10.1117/12.191951

3 November 1994 Ultra-clean fabrication techniques

Carl Johnson, Abdu Boudour, Eric T. Chase

Proceedings Volume 2254, Photomask and X-Ray Mask Technology; (1994) https://doi.org/10.1117/12.191951
Event: Photomask Japan '94, 1994, Kawasaki City, Kanagawa, Japan

Abstract

Current mask fabrication techniques are at their limit for producing masks which are free of soft defects. To provide a consistently higher quality product, an automated process with integrated inspection for process monitoring and control is required. This paper presents some of the design philosophies required to successfully implement such a system and their application in an available system.

Citation Download Citation

Carl Johnson, Abdu Boudour, and Eric T. Chase "Ultra-clean fabrication techniques", Proc. SPIE 2254, Photomask and X-Ray Mask Technology, (3 November 1994); https://doi.org/10.1117/12.191951

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