t-Boc protected poly(p-hydroxystyrene-alt-carbon monoxide): a new class of deep-UV resists

M. S. Brookhart; Joseph M. DeSimone; Robert E. Johnson; Shonali Tahiliani

doi:10.1117/12.210371

9 June 1995 t-Boc protected poly(p-hydroxystyrene-alt-carbon monoxide): a new class of deep-UV resists

M. S. Brookhart, Joseph M. DeSimone, Robert E. Johnson, Shonali Tahiliani

Proceedings Volume 2438, Advances in Resist Technology and Processing XII; (1995) https://doi.org/10.1117/12.210371
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

An efficient synthetic route for the synthesis of t-Boc protected poly (p-hydroxy styrene-alt- carbon monoxide) utilizing a Pd(II) catalyst is reported. The polymer was deprotected by thermolysis or acidolysis of the tert-butoxycarbonyl protecting group to give the p- hydroxystyrene/CO copolymer. This material should lend itself well to lithographic applications because of our ability to control the molar mass of the material with a narrow molar mass distribution (which should lend to high development efficiencies). Preliminary lithographic evaluation of the copolymer is reported herein.

Citation Download Citation

M. S. Brookhart, Joseph M. DeSimone, Robert E. Johnson, and Shonali Tahiliani "t-Boc protected poly(p-hydroxystyrene-alt-carbon monoxide): a new class of deep-UV resists", Proc. SPIE 2438, Advances in Resist Technology and Processing XII, (9 June 1995); https://doi.org/10.1117/12.210371

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