Recent progress in repair accuracy of the focused ion-beam mask repair system

Kazuo Aita; Anto Yasaka; Tadashi Kitamura; Hiroshi Matsumura; Yasushi Satoh; Hiroshi Nakamura; Junji Fujikawa; Katsuhide Tsuchiya; Shigeru Noguchi

doi:10.1117/12.245221

24 July 1996 Recent progress in repair accuracy of the focused ion-beam mask repair system

Kazuo Aita, Anto Yasaka, Tadashi Kitamura, Hiroshi Matsumura, Yasushi Satoh, Hiroshi Nakamura, Junji Fujikawa, Katsuhide Tsuchiya, Shigeru Noguchi

Author Affiliations +

Proceedings Volume 2793, Photomask and X-Ray Mask Technology III; (1996) https://doi.org/10.1117/12.245221
Event: Symposium on Photomask and X-Ray Mask Technology, 1996, Kawasaki City, Japan

Abstract

To improve the depth of focus (DOF) of isolated lines, attenuated assist feature (AAF) technique has been proposed; AAFs having more than 20% transmittance were located around an isolated line. In this mask, the transmittance and phase shift angle of AAF as well as its position and width have effects on lithographic performance. In particular, the phase shift angle has strong effect on focus latitude. The performances of two AAF masks (65% transmittance/28 degree phase shift and 40% transmittance/54 degree phase shift) were evaluated by using an NA equals 0.6, sigma- in)/(sigma) _out equals 0.42/0.7, i-line stepper. The focus latitude of 0.3 micrometer isolated line became flat around the best focus position with 28 degree phase shift AAFs. In conclusion, we can obtain wide DOF for isolated lines by selecting optimum phase shift angle of AAF.

Citation Download Citation

Kazuo Aita, Anto Yasaka, Tadashi Kitamura, Hiroshi Matsumura, Yasushi Satoh, Hiroshi Nakamura, Junji Fujikawa, Katsuhide Tsuchiya, and Shigeru Noguchi "Recent progress in repair accuracy of the focused ion-beam mask repair system", Proc. SPIE 2793, Photomask and X-Ray Mask Technology III, (24 July 1996); https://doi.org/10.1117/12.245221

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