First thin film ellipsometry at a photon energy of 97eV with use of high-performance multilayer polarizers

Masaki Yamamoto; K. Mayama; Hidekazu Kimura; Minaji Furudate; Mihiro Yanagihara

doi:10.1117/12.246183

16 August 1996 First thin film ellipsometry at a photon energy of 97eV with use of high-performance multilayer polarizers

Masaki Yamamoto, K. Mayama, Hidekazu Kimura, Minaji Furudate, Mihiro Yanagihara

Author Affiliations +

Proceedings Volume 2873, International Symposium on Polarization Analysis and Applications to Device Technology; (1996) https://doi.org/10.1117/12.246183
Event: International Symposium on Polarization Analysis and Applications to Device Technology, 1996, Yokohama, Japan

Abstract

In the extreme ultraviolet (EUV) region, synthetic multilayer structures are found useful as reflection polarizers. Such structures of transmission type made by removing from substrates are found useful as polarizers and phase shifters. With these multilayer polarizing elements developed, the first thin ellipsometry was performed at a photon energy of 97 eV (12.8 nm in wavelength), which demonstrated atomic sensitivity of the EUV ellipsometry.

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Masaki Yamamoto, K. Mayama, Hidekazu Kimura, Minaji Furudate, and Mihiro Yanagihara "First thin film ellipsometry at a photon energy of 97eV with use of high-performance multilayer polarizers", Proc. SPIE 2873, International Symposium on Polarization Analysis and Applications to Device Technology, (16 August 1996); https://doi.org/10.1117/12.246183

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