Paper
4 April 1997 Large-area surface-discharge UV light source for materials processing applications
Robert C. Sze
Author Affiliations +
Abstract
Performance of a 6 inch by 6 inch surface discharge that give integrated light intensities greater than 400 mJ/cm2 is reported here. Light uniformity on the surface of high density alumina dielectric has been measured to show better than 5% across the entire discharge area. Detailed spectroscopic content of these discharges in different gases and gas mixtures are presented from 160 nm to 735 nm region.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Robert C. Sze "Large-area surface-discharge UV light source for materials processing applications", Proc. SPIE 2987, Gas and Chemical Lasers and Applications II, (4 April 1997); https://doi.org/10.1117/12.271553
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KEYWORDS
Argon

Krypton

Dielectrics

Resistance

Helium

Materials processing

Gases

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