Microlithographic lenses

Romeo I. Mercado; Tomoyuki Matsuyama

doi:10.1117/12.322070

21 September 1998 Microlithographic lenses

Proceedings Volume 3482, International Optical Design Conference 1998; (1998) https://doi.org/10.1117/12.322070
Event: International Optical Design Conference, 1998, Kona, HI, United States

Abstract

High resolution microlithographic reduction lenses are described. Design examples of projection lenses for i-line exposure lithography and for excimer laser exposure system are presented. The performance evaluation of these designs are also shown.

Citation Download Citation

Romeo I. Mercado and Tomoyuki Matsuyama "Microlithographic lenses", Proc. SPIE 3482, International Optical Design Conference 1998, (21 September 1998); https://doi.org/10.1117/12.322070

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