Optical characterization of light-emitting porous silicon covered by transparent a-C:H coating

Alexander Dorofeev; Franco Gaspari; Dammika Manage; Emmanuel Sagnes; Tome Kosteski; Stefan Zukotynski

doi:10.1117/12.328604

4 December 1998 Optical characterization of light-emitting porous silicon covered by transparent a-C:H coating

Alexander Dorofeev, Franco Gaspari, Dammika Manage, Emmanuel Sagnes, Tome Kosteski, Stefan Zukotynski

Proceedings Volume 3491, 1998 International Conference on Applications of Photonic Technology III: Closing the Gap between Theory, Development, and Applications; (1998) https://doi.org/10.1117/12.328604
Event: 1998 International Conference on Applications of Photonic Technology, 1998, Ottawa, Canada

Abstract

Porous silicon (PS) is a promising but rather unstable photonic material. Plasma deposition of a protective amorphous hydrogenated carbon (a-C:H) coating was used to improve the stability of porous silicon's compositional and optical properties. a-C:H films, 0.2 - 0.5 micrometers thickness, were deposited on porous silicon at room temperature from a methane plasma generated in a five-electrode saddle-field glow-discharge chamber. Plasma-deposited films exhibited good adhesion, nano-scale smoothness, and excellent mechanical integrity. Photoluminescence, UV/VIS reflectance, SEM, and FTIR adsorption spectra of a-C:H/PS structures were measured. The a-C:H films were over 80% transparent in the 0.5 - 5 micrometers range and enhanced the stability of the luminescence of the light-emitting PS.

Citation Download Citation

Alexander Dorofeev, Franco Gaspari, Dammika Manage, Emmanuel Sagnes, Tome Kosteski, and Stefan Zukotynski "Optical characterization of light-emitting porous silicon covered by transparent a-C:H coating", Proc. SPIE 3491, 1998 International Conference on Applications of Photonic Technology III: Closing the Gap between Theory, Development, and Applications, (4 December 1998); https://doi.org/10.1117/12.328604

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