Converting SiO2 into crystalline Si for Si-based optoelectronics

Yin-Sheng Tang; S. J. Cai; Kang Lung Wang

doi:10.1117/12.342792

19 March 1999 Converting SiO₂into crystalline Si for Si-based optoelectronics

Yin-Sheng Tang, S. J. Cai, Kang Lung Wang

Proceedings Volume 3630, Silicon-based Optoelectronics; (1999) https://doi.org/10.1117/12.342792
Event: Optoelectronics '99 - Integrated Optoelectronic Devices, 1999, San Jose, CA, United States

Abstract

This paper reports a low cost method of converting SiO₂ or silica based glass into crystalline silicon by simple thermal annealing of Ti/Al coated SiO₂ or silica glass slides. The studies were performed using Raman scattering and x-ray diffraction. The results suggest that it is possible to extract reasonably good quality crystalline silicon from SiO₂ based substrates. This technique may have a wide range of applications in Si-based optoelectronics and other industry.

Citation Download Citation

Yin-Sheng Tang, S. J. Cai, and Kang Lung Wang "Converting SiO₂into crystalline Si for Si-based optoelectronics", Proc. SPIE 3630, Silicon-based Optoelectronics, (19 March 1999); https://doi.org/10.1117/12.342792

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