Paper
12 April 1999 Polycrystalline thin-film transistors on plastic substrates
Paul G. Carey, Patrick M. Smith, Steven D. Theiss, Paul Wickboldt, Thomas W. Sigmon
Author Affiliations +
Proceedings Volume 3636, Flat Panel Display Technology and Display Metrology; (1999) https://doi.org/10.1117/12.344632
Event: Electronic Imaging '99, 1999, San Jose, CA, United States
Abstract
Flat panel displays made on plastic substrates are envisioned for use in certain commercial and military systems because they are more rugged and lightweight than displays made on glass substrates. High information content can be attained for such displays using an active matrix array of thin film transistors (TFTs) for the pixels and high current TFTs for the drivers. In this work the fabrication of high performance polysilicon TFTs on flexible plastic substrates is presented along with corresponding electrical characteristics. Plastic substrates pose severe temperature constraints on the fabrication process. To overcome electrical characteristics. Plastic substrates pose sever temperature constraints on the fabrication process. To overcome these constraints, our group at LLNL has used low temperature silicon, oxide, and aluminum thin film deposition steps and pulsed excimer laser processing to perform the TFT channel crystallization and the source/drain doping. Sheet resistance values below 1k(Omega) /$DAL are obtained using our laser doping technique for 900 angstrom thick polysilicon films. Our n-channel polysilicon TFT electrical performance on plastic shows mobilities up to 50 cm2/V-sec and ON current to OFF current ratios of up to 1 X 106 for gate voltages from -1 to +35 V.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Paul G. Carey, Patrick M. Smith, Steven D. Theiss, Paul Wickboldt, and Thomas W. Sigmon "Polycrystalline thin-film transistors on plastic substrates", Proc. SPIE 3636, Flat Panel Display Technology and Display Metrology, (12 April 1999); https://doi.org/10.1117/12.344632
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Cited by 3 scholarly publications.
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KEYWORDS
Silicon

Semiconductor lasers

Laser crystals

Crystals

Doping

Excimer lasers

Oxides

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