Methacrylate resists and antireflective coatings for 193-nm lithography

Gary N. Taylor; Peter Trefonas III; Charles R. Szmanda; George G. Barclay; Robert J. Kavanagh; Robert F. Blacksmith; Lori Anne Joesten; Michael J. Monaghan; Suzanne Coley; Zhibiao Mao; James F. Cameron; Ricky Hardy; Dana Gronbeck; S. Connolly

doi:10.1117/12.350199

11 June 1999 Methacrylate resists and antireflective coatings for 193-nm lithography

Gary N. Taylor, Peter Trefonas III, Charles R. Szmanda, George G. Barclay, Robert J. Kavanagh, Robert F. Blacksmith, Lori Anne Joesten, Michael J. Monaghan, Suzanne Coley, Zhibiao Mao, James F. Cameron, Ricky Hardy, Dana Gronbeck, S. Connolly

Author Affiliations +

Proceedings Volume 3678, Advances in Resist Technology and Processing XVI; (1999) https://doi.org/10.1117/12.350199
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

Methacrylates were the first class of resist to be examined for use in 193nm lithography. They are still useful today, but have a very different molecular structure because of the requirements for development in 0.262N tetramethyl ammonium hydroxide and high etching resistance. A major driving force for their continued use is the availability of a wide variety of methacrylate monomers and the use of free racial polymerization which imparts a wide range of properties to the polymers and makes them very cost effective.

Citation Download Citation

Gary N. Taylor, Peter Trefonas III, Charles R. Szmanda, George G. Barclay, Robert J. Kavanagh, Robert F. Blacksmith, Lori Anne Joesten, Michael J. Monaghan, Suzanne Coley, Zhibiao Mao, James F. Cameron, Ricky Hardy, Dana Gronbeck, and S. Connolly "Methacrylate resists and antireflective coatings for 193-nm lithography", Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); https://doi.org/10.1117/12.350199

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