Paper
14 July 2000 Neural network modeling of growth processes
S. Venkateswaran, M. M. Rai, T. R. Govindan, Meyya Meyyappan
Author Affiliations +
Abstract
Process control based on first-principles models is possible if the information from the reactor simulations can be represented in a compact model. This is necessary since on- demand reactor simulation in real time for control purposes is not currently realistic. We have developed a neural network based model for applications in process control and process design.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
S. Venkateswaran, M. M. Rai, T. R. Govindan, and Meyya Meyyappan "Neural network modeling of growth processes", Proc. SPIE 3944, Physics and Simulation of Optoelectronic Devices VIII, (14 July 2000); https://doi.org/10.1117/12.391447
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KEYWORDS
Neural networks

Process control

Semiconducting wafers

Chemical vapor deposition

Data modeling

Process modeling

Computer simulations

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